Modulated wafer-scale WS(2) films based on atomic-layer-deposition for various device applications

Tungsten disulfide (WS(2)) is promising for potential applications in transistors and gas sensors due to its high mobility and high adsorption of gas molecules onto edge sites. This work comprehensively studied the deposition temperature, growth mechanism, annealing conditions, and Nb doping of WS(2...

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Detalles Bibliográficos
Autores principales: Guo, Xiangyu, Yang, Hanjie, Mo, Xichao, Bai, Rongxu, Wang, Yanrong, Han, Qi, Han, Sheng, Sun, Qingqing, Zhang, David W., Hu, Shen, Ji, Li
Formato: Online Artículo Texto
Lenguaje:English
Publicado: The Royal Society of Chemistry 2023
Materias:
Chemistry
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10184003/
https://www.ncbi.nlm.nih.gov/pubmed/37197184
http://dx.doi.org/10.1039/d3ra00933e

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10184003/
https://www.ncbi.nlm.nih.gov/pubmed/37197184
http://dx.doi.org/10.1039/d3ra00933e

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