Can We Rationally Design and Operate Spatial Atomic Layer Deposition Systems for Steering the Growth Regime of Thin Films?

[Image: see text] Fine control over the growth of materials is required to precisely tailor their properties. Spatial atomic layer deposition (SALD) is a thin-film deposition technique that has recently attracted attention because it allows producing thin films with a precise number of deposited lay...

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Detalles Bibliográficos
Autores principales: Vale, João Pedro, Sekkat, Abderrahime, Gheorghin, Thomas, Sevim, Semih, Mavromanolaki, Eirini, Flouris, Andreas D., Pané, Salvador, Muñoz-Rojas, David, Puigmartí-Luis, Josep, Sotto Mayor, Tiago
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2023
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10201529/
https://www.ncbi.nlm.nih.gov/pubmed/37223651
http://dx.doi.org/10.1021/acs.jpcc.3c02262

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10201529/
https://www.ncbi.nlm.nih.gov/pubmed/37223651
http://dx.doi.org/10.1021/acs.jpcc.3c02262

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