The Tailored Material Removal Distribution on Polyimide Membrane Can Be Obtained by Introducing Additional Electrodes

Reactive ion etching (RIE) is a promising material removal method for processing membrane diffractive optical elements and fabrication of meter-scale aperture optical substrates because of its high-efficiency parallel processing and low surface damage. However, the non-uniformity of the etching rate...

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Detalles Bibliográficos
Autores principales: Wu, Xiang, Fan, Bin, Xin, Qiang, Gao, Guohan, Jiao, Peiqi, Shao, Junming, Luo, Qian, Liang, Zhaoyu
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2023
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10223247/
https://www.ncbi.nlm.nih.gov/pubmed/37242969
http://dx.doi.org/10.3390/polym15102394

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10223247/
https://www.ncbi.nlm.nih.gov/pubmed/37242969
http://dx.doi.org/10.3390/polym15102394

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