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The Tailored Material Removal Distribution on Polyimide Membrane Can Be Obtained by Introducing Additional Electrodes
Reactive ion etching (RIE) is a promising material removal method for processing membrane diffractive optical elements and fabrication of meter-scale aperture optical substrates because of its high-efficiency parallel processing and low surface damage. However, the non-uniformity of the etching rate...
| Autores principales: | , , , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
MDPI
2023
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10223247/ https://www.ncbi.nlm.nih.gov/pubmed/37242969 http://dx.doi.org/10.3390/polym15102394 |