Approaches for Memristive Structures Using Scratching Probe Nanolithography: Towards Neuromorphic Applications

This paper proposes two different approaches to studying resistive switching of oxide thin films using scratching probe nanolithography of atomic force microscopy (AFM). These approaches allow us to assess the effects of memristor size and top-contact thickness on resistive switching. For that purpo...

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Detalles Bibliográficos
Autores principales: Tominov, Roman V., Vakulov, Zakhar E., Avilov, Vadim I., Shikhovtsov, Ivan A., Varganov, Vadim I., Kazantsev, Victor B., Gupta, Lovi Raj, Prakash, Chander, Smirnov, Vladimir A.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2023
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10223422/
https://www.ncbi.nlm.nih.gov/pubmed/37242000
http://dx.doi.org/10.3390/nano13101583

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10223422/
https://www.ncbi.nlm.nih.gov/pubmed/37242000
http://dx.doi.org/10.3390/nano13101583

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