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Approaches for Memristive Structures Using Scratching Probe Nanolithography: Towards Neuromorphic Applications
This paper proposes two different approaches to studying resistive switching of oxide thin films using scratching probe nanolithography of atomic force microscopy (AFM). These approaches allow us to assess the effects of memristor size and top-contact thickness on resistive switching. For that purpo...
Autores principales: | Tominov, Roman V., Vakulov, Zakhar E., Avilov, Vadim I., Shikhovtsov, Ivan A., Varganov, Vadim I., Kazantsev, Victor B., Gupta, Lovi Raj, Prakash, Chander, Smirnov, Vladimir A. |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2023
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10223422/ https://www.ncbi.nlm.nih.gov/pubmed/37242000 http://dx.doi.org/10.3390/nano13101583 |
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