Hardness, Modulus, and Refractive Index of Plasma-Assisted Atomic-Layer-Deposited Hafnium Oxide Thin Films Doped with Aluminum Oxide

Coatings with tunable refractive index and high mechanical resilience are useful in optical systems. In this work, thin films of HfO(2) doped with Al(2)O(3) were deposited on silicon at 300 °C by using plasma-enhanced atomic layer deposition (PE-ALD). The mainly amorphous 60–80 nm thick films consis...

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Detalles Bibliográficos
Autores principales: Kull, Mikk, Piirsoo, Helle-Mai, Tarre, Aivar, Mändar, Hugo, Tamm, Aile, Jõgiaas, Taivo
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2023
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10223527/
https://www.ncbi.nlm.nih.gov/pubmed/37242023
http://dx.doi.org/10.3390/nano13101607

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10223527/
https://www.ncbi.nlm.nih.gov/pubmed/37242023
http://dx.doi.org/10.3390/nano13101607

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