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Improved Endurance of Ferroelectric Hf(0.5)Zr(0.5)O(2) Using Laminated-Structure Interlayer

In this article, the endurance characteristic of the TiN/HZO/TiN capacitor was improved by the laminated structure of a ferroelectric Hf(0.5)Zr(0.5)O(2) thin film. Altering the HZO deposition ratio, the laminated-structure interlayer was formed in the middle of the HZO film. Although small remanent...

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Detalles Bibliográficos
Autores principales:	Chen, Meiwen, Lv, Shuxian, Wang, Boping, Jiang, Pengfei, Chen, Yuanxiang, Ding, Yaxin, Wang, Yuan, Chen, Yuting, Wang, Yan
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	MDPI 2023
Materias:	Article
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10224430/ https://www.ncbi.nlm.nih.gov/pubmed/37242025 http://dx.doi.org/10.3390/nano13101608

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