Redox Properties of TiO(2) Thin Films Grown on Mesoporous Silica by Atomic Layer Deposition

[Image: see text] The redox properties of titania films grown by ALD on SBA-15, a silica-based mesoporous material, were characterized as a function of thickness (that is, the number of ALD cycles used). (29)Si CP/MAS NMR helped to identify the nature of the surface species that form in the initial...

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Detalles Bibliográficos
Autores principales: Ke, Wang, Qin, Xiangdong, Palomino, Robert M., Simonovis, Juan Pablo, Senanayake, Sanjaya D., Rodriguez, José A., Zaera, Francisco
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2023
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10226118/
https://www.ncbi.nlm.nih.gov/pubmed/37171052
http://dx.doi.org/10.1021/acs.jpclett.3c00834

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10226118/
https://www.ncbi.nlm.nih.gov/pubmed/37171052
http://dx.doi.org/10.1021/acs.jpclett.3c00834

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