Low-Fluorescence Starter for Optical 3D Lithography of Sub-40 nm Structures

[Image: see text] Stimulated emission depletion (STED) has been used to break the diffraction limit in fluorescence microscopy. Inspired by this success, similar methods were used to reduce the structure size in three-dimensional, subdiffractional optical lithography. So far, only a very limited num...

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Detalles Bibliográficos
Autores principales: Gvindzhiliia, Georgii, Sivun, Dmitry, Naderer, Christoph, Jacak, Jaroslaw, Klar, Thomas A.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2023
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10226181/
https://www.ncbi.nlm.nih.gov/pubmed/37255503
http://dx.doi.org/10.1021/acsaom.3c00031

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10226181/
https://www.ncbi.nlm.nih.gov/pubmed/37255503
http://dx.doi.org/10.1021/acsaom.3c00031

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