Anti-adsorption Mechanism of Photoresist by Pluronic Surfactants: An Insight into Their Adsorbed Structure

[Image: see text] Photoresist stripping is the final step in the photolithography process that forms fine patterns for electronic devices. Recently, a mixture of ethylene carbonate (EC) and propylene carbonate (PC) has attracted attention as a new stripper based on its eco-friendliness and anti-corr...

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Detalles Bibliográficos
Autores principales: Hanzawa, Masaki, Ogura, Taku, Tsuchiya, Koji, Akamatsu, Masaaki, Sakai, Kenichi, Sakai, Hideki
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2023
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10249399/
https://www.ncbi.nlm.nih.gov/pubmed/37209170
http://dx.doi.org/10.1021/acs.langmuir.3c00714

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10249399/
https://www.ncbi.nlm.nih.gov/pubmed/37209170
http://dx.doi.org/10.1021/acs.langmuir.3c00714

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