Orthogonal Experimental Optimization of Preparation and Microstructural Properties of a Diffusion Barrier for Tantalum-Based Silicide Coatings

To solve the problem of silicide coatings on tantalum substrates failing due to elemental diffusion under high-temperature oxidation environments and to find diffusion barrier materials with excellent effects of impeding Si elemental spreading, TaB(2) and TaC coatings were prepared on tantalum subst...

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Detalles Bibliográficos
Autores principales: Xiao, Lairong, Xu, Jiawei, Zhou, Xiaojun, Zhang, Yafang, Deng, Guanzhi, Shen, Hongtai, Li, Wei, Zhao, Xiaojun, Cai, Zhenyang
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2023
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10254208/
https://www.ncbi.nlm.nih.gov/pubmed/37297230
http://dx.doi.org/10.3390/ma16114097

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10254208/
https://www.ncbi.nlm.nih.gov/pubmed/37297230
http://dx.doi.org/10.3390/ma16114097

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