High Performance On-Chip Energy Storage Capacitors with Plasma-Enhanced Atomic Layer-Deposited Hf(0.5)Zr(0.5)O(2)/Al-Doped Hf(0.25)Zr(0.75)O(2) Nanofilms as Dielectrics

Concurrently achieving high energy storage density (ESD) and efficiency has always been a big challenge for electrostatic energy storage capacitors. In this study, we successfully fabricate high-performance energy storage capacitors by using antiferroelectric (AFE) Al-doped Hf(0.25)Zr(0.75)O(2) (HfZ...

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Detalles Bibliográficos
Autores principales: He, Yuli, Zheng, Guang, Zhu, Bao, Wu, Xiaohan, Liu, Wen-Jun, Zhang, David Wei, Ding, Shi-Jin
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2023
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10254242/
https://www.ncbi.nlm.nih.gov/pubmed/37299668
http://dx.doi.org/10.3390/nano13111765

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10254242/
https://www.ncbi.nlm.nih.gov/pubmed/37299668
http://dx.doi.org/10.3390/nano13111765

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