Atomistic Simulation of Physical Vapor Deposition of Optical Thin Films

A review of the methods and results of atomistic modeling of the deposition of thin optical films and a calculation of their characteristics is presented. The simulation of various processes in a vacuum chamber, including target sputtering and the formation of film layers, is considered. Methods for...

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Detalles Bibliográficos
Autores principales: Grigoriev, Fedor Vasilievich, Sulimov, Vladimir Borisovich
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2023
Materias:
Review
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10254358/
https://www.ncbi.nlm.nih.gov/pubmed/37299620
http://dx.doi.org/10.3390/nano13111717

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10254358/
https://www.ncbi.nlm.nih.gov/pubmed/37299620
http://dx.doi.org/10.3390/nano13111717

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