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Atomistic Simulation of Physical Vapor Deposition of Optical Thin Films
A review of the methods and results of atomistic modeling of the deposition of thin optical films and a calculation of their characteristics is presented. The simulation of various processes in a vacuum chamber, including target sputtering and the formation of film layers, is considered. Methods for...
| Autores principales: | , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
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MDPI
2023
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| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10254358/ https://www.ncbi.nlm.nih.gov/pubmed/37299620 http://dx.doi.org/10.3390/nano13111717 |