Atomic Layer Deposition of HfO(2) Films Using TDMAH and Water or Ammonia Water

Atomic layer deposition of HfO(2) from TDMAH and water or ammonia water at different temperatures below 400 °C is studied. Growth per cycle (GPC) has been recorded in the range of 1.2–1.6 Å. At low temperatures (≤100 °C), the films grew faster and are structurally more disordered, amorphous and/or p...

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Detalles Bibliográficos
Autores principales: Gieraltowska, Sylwia, Wachnicki, Lukasz, Dluzewski, Piotr, Witkowski, Bartlomiej S., Godlewski, Marek, Guziewicz, Elzbieta
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2023
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10254648/
https://www.ncbi.nlm.nih.gov/pubmed/37297215
http://dx.doi.org/10.3390/ma16114077

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10254648/
https://www.ncbi.nlm.nih.gov/pubmed/37297215
http://dx.doi.org/10.3390/ma16114077

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