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Edge contacts accelerate the response of MoS(2) photodetectors
We use a facile plasma etching process to define contacts with an embedded edge geometry for multilayer MoS(2) photodetectors. Compared to the conventional top contact geometry, the detector response time is accelerated by more than an order of magnitude by this action. We attribute this improvement...
| Autores principales: | , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
RSC
2023
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10295078/ https://www.ncbi.nlm.nih.gov/pubmed/37383070 http://dx.doi.org/10.1039/d3na00223c |