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Edge contacts accelerate the response of MoS(2) photodetectors

We use a facile plasma etching process to define contacts with an embedded edge geometry for multilayer MoS(2) photodetectors. Compared to the conventional top contact geometry, the detector response time is accelerated by more than an order of magnitude by this action. We attribute this improvement...

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Detalles Bibliográficos
Autores principales:	Strauß, Fabian, Schedel, Christine, Scheele, Marcus
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	RSC 2023
Materias:	Chemistry
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10295078/ https://www.ncbi.nlm.nih.gov/pubmed/37383070 http://dx.doi.org/10.1039/d3na00223c

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