Magnetoresistance and Magnetic Relaxation of La-Sr-Mn-O Films Grown on Si/SiO(2) Substrate by Pulsed Injection MOCVD

The results of magnetoresistance (MR) and resistance relaxation of nanostructured La(1−x)Sr(x)Mn(y)O(3) (LSMO) films with different film thicknesses (60–480 nm) grown on Si/SiO(2) substrate by the pulsed-injection MOCVD technique are presented and compared with the reference manganite LSMO/Al(2)O(3)...

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Detalles Bibliográficos
Autores principales: Žurauskienė, Nerija, Rudokas, Vakaris, Tolvaišienė, Sonata
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2023
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10301532/
https://www.ncbi.nlm.nih.gov/pubmed/37420532
http://dx.doi.org/10.3390/s23125365

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10301532/
https://www.ncbi.nlm.nih.gov/pubmed/37420532
http://dx.doi.org/10.3390/s23125365

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