On the Microcrystal Structure of Sputtered Cu Films Deposited on Si(100) Surfaces: Experiment and Integrated Multiscale Simulation

Sputtered Cu/Si thin films were experimentally prepared at different sputtering pressures and characterized using X-ray diffraction (XRD) and an atomic force microscope (AFM). Simultaneously, an application-oriented simulation approach for magnetron sputtering deposition was proposed in this work. I...

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Detalles Bibliográficos
Autores principales: Zhu, Guo, Han, Mengxin, Xiao, Baijun, Gan, Zhiyin
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2023
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10301675/
https://www.ncbi.nlm.nih.gov/pubmed/37375341
http://dx.doi.org/10.3390/molecules28124786

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10301675/
https://www.ncbi.nlm.nih.gov/pubmed/37375341
http://dx.doi.org/10.3390/molecules28124786

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