Comparative Study of Thermal and Plasma-Enhanced Atomic Layer Deposition of Iron Oxide Using Bis(N,N′-di-butylacetamidinato)iron(II)

Only a few iron precursors that can be used in the atomic layer deposition (ALD) of iron oxides have been examined thus far. This study aimed to compare the various properties of FeO(x) thin films deposited using thermal ALD and plasma-enhanced ALD (PEALD) and to evaluate the advantages and disadvan...

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Detalles Bibliográficos
Autores principales: Choi, Boyun, Park, Gun-Woo, Jeong, Jong-Ryul, Jeon, Nari
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2023
Materias:
Communication
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10303090/
https://www.ncbi.nlm.nih.gov/pubmed/37368288
http://dx.doi.org/10.3390/nano13121858

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10303090/
https://www.ncbi.nlm.nih.gov/pubmed/37368288
http://dx.doi.org/10.3390/nano13121858

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