Antireflection Structures for VIS and NIR on Arbitrarily Shaped Fused Silica Substrates with Colloidal Polystyrene Nanosphere Lithography

Antireflective (AR) nanostructures offer an effective, broadband alternative to conventional AR coatings that could be used even under extreme conditions. In this publication, a possible fabrication process based on colloidal polystyrene (PS) nanosphere lithography for the fabrication of such AR str...

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Detalles Bibliográficos
Autores principales: Schmelz, David, Jia, Guobin, Käsebier, Thomas, Plentz, Jonathan, Zeitner, Uwe Detlef
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2023
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10305381/
https://www.ncbi.nlm.nih.gov/pubmed/37374789
http://dx.doi.org/10.3390/mi14061204

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10305381/
https://www.ncbi.nlm.nih.gov/pubmed/37374789
http://dx.doi.org/10.3390/mi14061204

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