X-ray mirrors with sub-nanometre figure errors obtained by differential deposition of thin WSi(2) films

Differential deposition by DC magnetron sputtering was applied to correct for figure errors of X-ray mirrors to be deployed on low-emittance synchrotron beamlines. During the deposition process, the mirrors were moved in front of a beam-defining aperture and the required velocity profile was calcula...

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Detalles Bibliográficos
Autores principales: Bras, Patrice, Morawe, Christian, Labouré, Sylvain, Perrin, François, Vivo, Amparo, Barrett, Raymond
Formato: Online Artículo Texto
Lenguaje:English
Publicado: International Union of Crystallography 2023
Materias:
Research Papers
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10325008/
https://www.ncbi.nlm.nih.gov/pubmed/37255023
http://dx.doi.org/10.1107/S1600577523003697

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10325008/
https://www.ncbi.nlm.nih.gov/pubmed/37255023
http://dx.doi.org/10.1107/S1600577523003697

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