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X-ray mirrors with sub-nanometre figure errors obtained by differential deposition of thin WSi(2) films
Differential deposition by DC magnetron sputtering was applied to correct for figure errors of X-ray mirrors to be deployed on low-emittance synchrotron beamlines. During the deposition process, the mirrors were moved in front of a beam-defining aperture and the required velocity profile was calcula...
| Autores principales: | , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
International Union of Crystallography
2023
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10325008/ https://www.ncbi.nlm.nih.gov/pubmed/37255023 http://dx.doi.org/10.1107/S1600577523003697 |