Structural Analysis of Si(OEt)(4) Deposits on Au(111)/SiO(2) Substrates at the Nanometer Scale Using Focused Electron Beam-Induced Deposition

[Image: see text] The focused electron beam-induced deposition (FEBID) process was used by employing a GeminiSEM with a beam characteristic of 1 keV and 24 pA to deposit pillars and line-shaped nanostructures with heights between 9 nm and 1 μm and widths from 5 nm to 0.5 μm. All structures have been...

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Detalles Bibliográficos
Autores principales: Mason, Nigel J., Pintea, Maria, Csarnovics, István, Fodor, Tamás, Szikszai, Zita, Kertész, Zsófia
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2023
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10339401/
https://www.ncbi.nlm.nih.gov/pubmed/37457449
http://dx.doi.org/10.1021/acsomega.3c00793

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10339401/
https://www.ncbi.nlm.nih.gov/pubmed/37457449
http://dx.doi.org/10.1021/acsomega.3c00793

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