Influence of Deposition Time on Titanium Nitride (TiN) Thin Film Coating Synthesis Using Chemical Vapour Deposition

Titanium nitride (TiN) thin film coatings were grown over silicon ([Formula: see text]-type) substrate using the atmospheric pressure chemical vapour deposition (APCVD) technique. The synthesis process was carried out to evaluate the effect of deposition time on the physical and mechanical character...

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Detalles Bibliográficos
Autores principales: Ghadai, Ranjan Kumar, Logesh, Kamaraj, Čep, Robert, Chohan, Jasgurpreet Singh, Kalita, Kanak
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2023
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10342551/
https://www.ncbi.nlm.nih.gov/pubmed/37444924
http://dx.doi.org/10.3390/ma16134611

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10342551/
https://www.ncbi.nlm.nih.gov/pubmed/37444924
http://dx.doi.org/10.3390/ma16134611

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