Nucleation of Co and Ru Precursors on Silicon with Different Surface Terminations: Impact on Nucleation Delay

[Image: see text] Early transition metals ruthenium (Ru) and cobalt (Co) are of high interest as replacements for Cu in next-generation interconnects. Plasma-enhanced atomic layer deposition (PE-ALD) is used to deposit metal thin films in high-aspect-ratio structures of vias and trenches in nanoelec...

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Detalles Bibliográficos
Autores principales: Liu, Ji, Mullins, Rita, Lu, Hongliang, Zhang, David Wei, Nolan, Michael
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2023
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10364078/
https://www.ncbi.nlm.nih.gov/pubmed/37492191
http://dx.doi.org/10.1021/acs.jpcc.3c02933

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10364078/
https://www.ncbi.nlm.nih.gov/pubmed/37492191
http://dx.doi.org/10.1021/acs.jpcc.3c02933

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