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Nucleation of Co and Ru Precursors on Silicon with Different Surface Terminations: Impact on Nucleation Delay
[Image: see text] Early transition metals ruthenium (Ru) and cobalt (Co) are of high interest as replacements for Cu in next-generation interconnects. Plasma-enhanced atomic layer deposition (PE-ALD) is used to deposit metal thin films in high-aspect-ratio structures of vias and trenches in nanoelec...
| Autores principales: | , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
American Chemical Society
2023
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| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10364078/ https://www.ncbi.nlm.nih.gov/pubmed/37492191 http://dx.doi.org/10.1021/acs.jpcc.3c02933 |