Toolbox of Advanced Atomic Layer Deposition Processes for Tailoring Large-Area MoS(2) Thin Films at 150 °C

[Image: see text] Two-dimensional MoS(2) is a promising material for applications, including electronics and electrocatalysis. However, scalable methods capable of depositing MoS(2) at low temperatures are scarce. Herein, we present a toolbox of advanced plasma-enhanced atomic layer deposition (ALD)...

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Detalles Bibliográficos
Autores principales: Mattinen, Miika, Schulpen, Jeff J. P. M., Dawley, Rebecca A., Gity, Farzan, Verheijen, Marcel A., Kessels, Wilhelmus M. M., Bol, Ageeth A.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2023
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10375433/
https://www.ncbi.nlm.nih.gov/pubmed/37459249
http://dx.doi.org/10.1021/acsami.3c02466

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10375433/
https://www.ncbi.nlm.nih.gov/pubmed/37459249
http://dx.doi.org/10.1021/acsami.3c02466

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