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On Relationships between Plasma Chemistry and Surface Reaction Kinetics Providing the Etching of Silicon in CF(4), CHF(3), and C(4)F(8) Gases Mixed with Oxygen
In this work, we discuss the effects of component ratios on plasma characteristics, chemistry of active species, and silicon etching kinetics in CF(4) + O(2), CHF(3) + O(2), and C(4)F(8) + O(2) gas mixtures. It was shown that the addition of O(2) changes electrons- and ions-related plasma parameters...
| Autores principales: | , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
MDPI
2023
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10383355/ https://www.ncbi.nlm.nih.gov/pubmed/37512317 http://dx.doi.org/10.3390/ma16145043 |