Chemically Amplified Molecular Glass Photoresist Regulated by 2-Aminoanthracene Additive for Electron Beam Lithography and Extreme Ultraviolet Lithography

[Image: see text] 2-Aminoanthracene was used as a nucleophilic additive in a molecular glass photoresist, bisphenol A derivative (BPA-6-epoxy), to improve advanced lithography performance. The effect of 2-aminoanthracene on BPA-6-epoxy was studied by electron beam lithography (EBL) and extreme ultra...

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Detalles Bibliográficos
Autores principales: Zhang, Siliang, Chen, Long, Gao, Jiaxing, Cui, Xuewen, Cong, Xue, Guo, Xudong, Hu, Rui, Wang, Shuangqing, Chen, Jinping, Li, Yi, Yang, Guoqiang
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2023
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10398843/
https://www.ncbi.nlm.nih.gov/pubmed/37546582
http://dx.doi.org/10.1021/acsomega.2c07711

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10398843/
https://www.ncbi.nlm.nih.gov/pubmed/37546582
http://dx.doi.org/10.1021/acsomega.2c07711

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