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Ultralow-energy amorphization of contaminated silicon samples investigated by molecular dynamics

Ion beam processes related to focused ion beam milling, surface patterning, and secondary ion mass spectrometry require precision and control. Quality and cleanliness of the sample are also crucial factors. Furthermore, several domains of nanotechnology and industry use nanoscaled samples that need...

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Detalles Bibliográficos
Autores principales: Defoort-Levkov, Grégoire R N, Bahm, Alan, Philipp, Patrick
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Beilstein-Institut 2023
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10407782/
https://www.ncbi.nlm.nih.gov/pubmed/37560350
http://dx.doi.org/10.3762/bjnano.14.68