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Ultralow-energy amorphization of contaminated silicon samples investigated by molecular dynamics
Ion beam processes related to focused ion beam milling, surface patterning, and secondary ion mass spectrometry require precision and control. Quality and cleanliness of the sample are also crucial factors. Furthermore, several domains of nanotechnology and industry use nanoscaled samples that need...
| Autores principales: | , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Beilstein-Institut
2023
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10407782/ https://www.ncbi.nlm.nih.gov/pubmed/37560350 http://dx.doi.org/10.3762/bjnano.14.68 |