High-Resolution Laser Interference Ablation and Amorphization of Silicon

The laser interference patterning of a silicon surface via UV femtosecond pulse irradiation, resulting in 350 nm periodic structures, is demonstrated. The structuring process was performed using a laser with a 450 fs pulse duration at a wavelength of 248 nm in combination with a mask projection setu...

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Detalles Bibliográficos
Autores principales: Blumenstein, Andreas, Simon, Peter, Ihlemann, Jürgen
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2023
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10421211/
https://www.ncbi.nlm.nih.gov/pubmed/37570557
http://dx.doi.org/10.3390/nano13152240

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10421211/
https://www.ncbi.nlm.nih.gov/pubmed/37570557
http://dx.doi.org/10.3390/nano13152240

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