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Low-resistivity, high-resolution W-C electrical contacts fabricated by direct-write focused electron beam induced deposition
Background: The use of a focused ion beam to decompose a precursor gas and produce a metallic deposit is a widespread nanolithographic technique named focused ion beam induced deposition (FIBID). However, such an approach is unsuitable if the sample under study is sensitive to the somewhat aggressiv...
Autores principales: | , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
F1000 Research Limited
2022
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10446045/ https://www.ncbi.nlm.nih.gov/pubmed/37645310 http://dx.doi.org/10.12688/openreseurope.15000.1 |
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author | Orús, Pablo Sigloch, Fabian Sangiao, Soraya De Teresa, José María |
author_facet | Orús, Pablo Sigloch, Fabian Sangiao, Soraya De Teresa, José María |
author_sort | Orús, Pablo |
collection | PubMed |
description | Background: The use of a focused ion beam to decompose a precursor gas and produce a metallic deposit is a widespread nanolithographic technique named focused ion beam induced deposition (FIBID). However, such an approach is unsuitable if the sample under study is sensitive to the somewhat aggressive exposure to the ion beam, which induces the effects of surface amorphization, local milling, and ion implantation, among others. An alternative strategy is that of focused electron beam induced deposition (FEBID), which makes use of a focused electron beam instead, and in general yields deposits with much lower metallic content than their FIBID counterparts. Methods: In this work, we optimize the deposition of tungsten-carbon (W-C) nanowires by FEBID to be used as electrical contacts by assessing the impact of the deposition parameters during growth, evaluating their chemical composition, and investigating their electrical response. Results: Under the optimized irradiation conditions, the samples exhibit a metallic content high enough for them to be utilized for this purpose, showing a room-temperature resistivity of 550 μΩ cm and maintaining their conducting properties down to 2 K. The lateral resolution of such FEBID W-C metallic nanowires is 45 nm. Conclusions: The presented optimized procedure may prove a valuable tool for the fabrication of contacts on samples where the FIBID approach is not advised |
format | Online Article Text |
id | pubmed-10446045 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2022 |
publisher | F1000 Research Limited |
record_format | MEDLINE/PubMed |
spelling | pubmed-104460452023-08-29 Low-resistivity, high-resolution W-C electrical contacts fabricated by direct-write focused electron beam induced deposition Orús, Pablo Sigloch, Fabian Sangiao, Soraya De Teresa, José María Open Res Eur Research Article Background: The use of a focused ion beam to decompose a precursor gas and produce a metallic deposit is a widespread nanolithographic technique named focused ion beam induced deposition (FIBID). However, such an approach is unsuitable if the sample under study is sensitive to the somewhat aggressive exposure to the ion beam, which induces the effects of surface amorphization, local milling, and ion implantation, among others. An alternative strategy is that of focused electron beam induced deposition (FEBID), which makes use of a focused electron beam instead, and in general yields deposits with much lower metallic content than their FIBID counterparts. Methods: In this work, we optimize the deposition of tungsten-carbon (W-C) nanowires by FEBID to be used as electrical contacts by assessing the impact of the deposition parameters during growth, evaluating their chemical composition, and investigating their electrical response. Results: Under the optimized irradiation conditions, the samples exhibit a metallic content high enough for them to be utilized for this purpose, showing a room-temperature resistivity of 550 μΩ cm and maintaining their conducting properties down to 2 K. The lateral resolution of such FEBID W-C metallic nanowires is 45 nm. Conclusions: The presented optimized procedure may prove a valuable tool for the fabrication of contacts on samples where the FIBID approach is not advised F1000 Research Limited 2022-08-25 /pmc/articles/PMC10446045/ /pubmed/37645310 http://dx.doi.org/10.12688/openreseurope.15000.1 Text en Copyright: © 2022 Orús P et al. https://creativecommons.org/licenses/by/4.0/This is an open access article distributed under the terms of the Creative Commons Attribution Licence, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. |
spellingShingle | Research Article Orús, Pablo Sigloch, Fabian Sangiao, Soraya De Teresa, José María Low-resistivity, high-resolution W-C electrical contacts fabricated by direct-write focused electron beam induced deposition |
title | Low-resistivity, high-resolution W-C electrical contacts fabricated by direct-write focused electron beam induced deposition |
title_full | Low-resistivity, high-resolution W-C electrical contacts fabricated by direct-write focused electron beam induced deposition |
title_fullStr | Low-resistivity, high-resolution W-C electrical contacts fabricated by direct-write focused electron beam induced deposition |
title_full_unstemmed | Low-resistivity, high-resolution W-C electrical contacts fabricated by direct-write focused electron beam induced deposition |
title_short | Low-resistivity, high-resolution W-C electrical contacts fabricated by direct-write focused electron beam induced deposition |
title_sort | low-resistivity, high-resolution w-c electrical contacts fabricated by direct-write focused electron beam induced deposition |
topic | Research Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10446045/ https://www.ncbi.nlm.nih.gov/pubmed/37645310 http://dx.doi.org/10.12688/openreseurope.15000.1 |
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