Spatial modulation of scalable nanostructures by combining maskless plasmonic lithography and grayscale-patterned strategy

Nanolithography techniques providing good scalability and feature size controllability are of great importance for the fabrication of integrated circuits (IC), MEMS/NEMS, optical devices, nanophotonics, etc. Herein, a cost-effective, easy access, and high-fidelity patterning strategy that combines t...

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Detalles Bibliográficos
Autores principales: Han, Dandan, Ye, Tianchun, Wei, Yayi
Formato: Online Artículo Texto
Lenguaje:English
Publicado: RSC 2023
Materias:
Chemistry
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10448319/
https://www.ncbi.nlm.nih.gov/pubmed/37638165
http://dx.doi.org/10.1039/d3na00147d

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10448319/
https://www.ncbi.nlm.nih.gov/pubmed/37638165
http://dx.doi.org/10.1039/d3na00147d

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