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Spatial modulation of scalable nanostructures by combining maskless plasmonic lithography and grayscale-patterned strategy
Nanolithography techniques providing good scalability and feature size controllability are of great importance for the fabrication of integrated circuits (IC), MEMS/NEMS, optical devices, nanophotonics, etc. Herein, a cost-effective, easy access, and high-fidelity patterning strategy that combines t...
| Autores principales: | , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
RSC
2023
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10448319/ https://www.ncbi.nlm.nih.gov/pubmed/37638165 http://dx.doi.org/10.1039/d3na00147d |