Rectangular Amplitude Mask-Based Auto-Focus Method with a Large Range and High Precision for a Micro-LED Wafer Defects Detection System

Auto-focus technology plays an important role in the Micro-LED wafer defects detection system. How to accurately measure the defocus amount and the defocus direction of the Micro-LED wafer sample in a large linear range is one of the keys to realizing wafer defects detection. In this paper, a large...

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Detalles Bibliográficos
Autores principales: He, Wenjun, Ma, Yufeng, Wang, Wenbo
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2023
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10490662/
https://www.ncbi.nlm.nih.gov/pubmed/37688033
http://dx.doi.org/10.3390/s23177579

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10490662/
https://www.ncbi.nlm.nih.gov/pubmed/37688033
http://dx.doi.org/10.3390/s23177579

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