Wafer‐Level Manufacturing of MEMS H(2) Sensing Chips Based on Pd Nanoparticles Modified SnO(2) Film Patterns

In this manuscript, a simple method combining atomic layer deposition and magnetron sputtering is developed to fabricate high‐performance Pd/SnO(2) film patterns applied for micro‐electro‐mechanical systems (MEMS) H(2) sensing chips. SnO(2) film is first accurately deposited in the central areas of...

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Detalles Bibliográficos
Autores principales: Zhang, Zheng, Luo, Liyang, Zhang, Yanlin, Lv, Guoliang, Luo, Yuanyuan, Duan, Guotao
Formato: Online Artículo Texto
Lenguaje:English
Publicado: John Wiley and Sons Inc. 2023
Materias:
Research Articles
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10502828/
https://www.ncbi.nlm.nih.gov/pubmed/37400367
http://dx.doi.org/10.1002/advs.202302614

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10502828/
https://www.ncbi.nlm.nih.gov/pubmed/37400367
http://dx.doi.org/10.1002/advs.202302614

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