Effect of Substrate Negative Bias on the Microstructural, Optical, Mechanical, and Laser Damage Resistance Properties of HfO(2) Thin Films Grown by DC Reactive Magnetron Sputtering

Hafnium oxide thin films have attracted great attention as promising materials for applications in the field of optical thin films and microelectronic devices. In this paper, hafnium oxide thin films were prepared via DC magnetron sputtering deposition on a quartz substrate. The influence of various...

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Detalles Bibliográficos
Autores principales: Xi, Yingxue, Qin, Xinghui, Li, Wantong, Luo, Xi, Zhang, Jin, Liu, Weiguo, Yang, Pengfei
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2023
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10538217/
https://www.ncbi.nlm.nih.gov/pubmed/37763963
http://dx.doi.org/10.3390/mi14091800

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10538217/
https://www.ncbi.nlm.nih.gov/pubmed/37763963
http://dx.doi.org/10.3390/mi14091800

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