Mechanical and Optical Properties of Cr(2)O(3) Thin Films Grown by Atomic Layer Deposition Method Using Cr(thd)(3) and Ozone

Cr(2)O(3) thin films were grown on a Si (1 0 0) substrate using Cr(thd)(3) and O(3) by atomic layer deposition (ALD) at substrate temperatures (T(G)) from 200 to 300 °C. X-ray amorphous films were deposited at a T(G) ≤ 225 °C, whereas at higher temperatures (T(G) ≥ 250 °C), the eskolaite phase was o...

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Detalles Bibliográficos
Autores principales: Salari Mehr, Mahtab, Aarik, Lauri, Jõgiaas, Taivo, Kasikov, Aarne, Damerchi, Elyad, Mändar, Hugo
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2023
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10574646/
https://www.ncbi.nlm.nih.gov/pubmed/37836343
http://dx.doi.org/10.3390/nano13192702

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10574646/
https://www.ncbi.nlm.nih.gov/pubmed/37836343
http://dx.doi.org/10.3390/nano13192702

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