Cargando…
Mechanical and Optical Properties of Cr(2)O(3) Thin Films Grown by Atomic Layer Deposition Method Using Cr(thd)(3) and Ozone
Cr(2)O(3) thin films were grown on a Si (1 0 0) substrate using Cr(thd)(3) and O(3) by atomic layer deposition (ALD) at substrate temperatures (T(G)) from 200 to 300 °C. X-ray amorphous films were deposited at a T(G) ≤ 225 °C, whereas at higher temperatures (T(G) ≥ 250 °C), the eskolaite phase was o...
| Autores principales: | , , , , , |
|---|---|
| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
MDPI
2023
|
| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10574646/ https://www.ncbi.nlm.nih.gov/pubmed/37836343 http://dx.doi.org/10.3390/nano13192702 |