Stearic Acid as an Atomic Layer Deposition Inhibitor: Spectroscopic Insights from AFM-IR

Modern-day chip manufacturing requires precision in placing chip materials on complex and patterned structures. Area-selective atomic layer deposition (AS-ALD) is a self-aligned manufacturing technique with high precision and control, which offers cost effectiveness compared to the traditional patte...

Descripción completa

Detalles Bibliográficos
Autores principales: Satyarthy, Saumya, Hasan Ul Iqbal, Md, Abida, Fairoz, Nahar, Ridwan, Hauser, Adam J., Cheng, Mark Ming-Cheng, Ghosh, Ayanjeet
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2023
Materias:
Communication
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10574727/
https://www.ncbi.nlm.nih.gov/pubmed/37836354
http://dx.doi.org/10.3390/nano13192713

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10574727/
https://www.ncbi.nlm.nih.gov/pubmed/37836354
http://dx.doi.org/10.3390/nano13192713

Ejemplares similares