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Stearic Acid as an Atomic Layer Deposition Inhibitor: Spectroscopic Insights from AFM-IR

Modern-day chip manufacturing requires precision in placing chip materials on complex and patterned structures. Area-selective atomic layer deposition (AS-ALD) is a self-aligned manufacturing technique with high precision and control, which offers cost effectiveness compared to the traditional patte...

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Detalles Bibliográficos
Autores principales:	Satyarthy, Saumya, Hasan Ul Iqbal, Md, Abida, Fairoz, Nahar, Ridwan, Hauser, Adam J., Cheng, Mark Ming-Cheng, Ghosh, Ayanjeet
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	MDPI 2023
Materias:	Communication
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10574727/ https://www.ncbi.nlm.nih.gov/pubmed/37836354 http://dx.doi.org/10.3390/nano13192713

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