Temperature-Dependent Structural and Electrical Properties of Metal-Organic CVD MoS(2) Films

Metal-Organic CVD method (MOCVD) allows for deposition of ultrathin 2D transition metal dichalcogenides (TMD) films of electronic quality onto wafer-scale substrates. In this work, the effect of temperature on structure, chemical states, and electronic qualities of the MOCVD MoS(2) films were invest...

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Detalles Bibliográficos
Autores principales: Romanov, Roman I., Zabrosaev, Ivan V., Chouprik, Anastasia A., Yakubovsky, Dmitry I., Tatmyshevskiy, Mikhail K., Volkov, Valentyn S., Markeev, Andrey M.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2023
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10574732/
https://www.ncbi.nlm.nih.gov/pubmed/37836353
http://dx.doi.org/10.3390/nano13192712

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10574732/
https://www.ncbi.nlm.nih.gov/pubmed/37836353
http://dx.doi.org/10.3390/nano13192712

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