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Ultraviolet Photodetector Based on a Beta-Gallium Oxide/Nickel Oxide/Beta-Gallium Oxide Heterojunction Structure

In this paper, an n–p–n structure based on a β-Ga(2)O(3)/NiO/β-Ga(2)O(3) junction was fabricated. The device based on the β-Ga(2)O(3)/NiO/β-Ga(2)O(3) structure, as an ultraviolet (UV) photodetector, was compared with a p–n diode based on a NiO/β-Ga(2)O(3) structure, where it showed rectification and...

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Detalles Bibliográficos
Autor principal: Nakagomi, Shinji
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2023
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10575374/
https://www.ncbi.nlm.nih.gov/pubmed/37837164
http://dx.doi.org/10.3390/s23198332
Descripción
Sumario:In this paper, an n–p–n structure based on a β-Ga(2)O(3)/NiO/β-Ga(2)O(3) junction was fabricated. The device based on the β-Ga(2)O(3)/NiO/β-Ga(2)O(3) structure, as an ultraviolet (UV) photodetector, was compared with a p–n diode based on a NiO/β-Ga(2)O(3) structure, where it showed rectification and 10 times greater responsivity and amplified the photocurrent. The reverse current increased in proportion to the 1.5 power of UV light intensity. The photocurrent amplification was related to the accumulation of holes in the NiO layer given by the heterobarrier for holes from the NiO layer to the β-Ga(2)O(3) layer. Moreover, the device could respond to an optical pulse of less than a few microseconds.