Measurement and Simulation of Ultra-Low-Energy Ion–Solid Interaction Dynamics

Ion implantation is a key capability for the semiconductor industry. As devices shrink, novel materials enter the manufacturing line, and quantum technologies transition to being more mainstream. Traditional implantation methods fall short in terms of energy, ion species, and positional precision. H...

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Detalles Bibliográficos
Autores principales: Titze, Michael, Poplawsky, Jonathan D., Kretschmer, Silvan, Krasheninnikov, Arkady V., Doyle, Barney L., Bielejec, Edward S., Hobler, Gerhard, Belianinov, Alex
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2023
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10609604/
https://www.ncbi.nlm.nih.gov/pubmed/37893321
http://dx.doi.org/10.3390/mi14101884

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10609604/
https://www.ncbi.nlm.nih.gov/pubmed/37893321
http://dx.doi.org/10.3390/mi14101884

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