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Introduction of Nanoscale Si(3)N(4) to Improve the Dielectric Thermal Stability of a Si(3)N(4)/P(VDF-HFP) Composite Film
In order to improve the dielectric thermal stability of polyvinylidene fluoride (PVDF)-based film, nano silicon nitride (Si(3)N(4)) was introduced, and hence the energy storage performance was improved. The introduction of nano Si(3)N(4) fillers will induce a phase transition of P(VDF-HFP) from pola...
| Autores principales: | , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
MDPI
2023
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10648552/ https://www.ncbi.nlm.nih.gov/pubmed/37959943 http://dx.doi.org/10.3390/polym15214264 |