Cargando…

Surface Roughness-Induced Changes in Important Physical Features of CoFeSm Thin Films on Glass Substrates during Annealing

Co(60)Fe(20)Sm(20) thin films were deposited onto glass substrates in a high vacuum setting. The films varied in thickness from 10 to 50 nm and underwent annealing processes at different temperatures: room temperature (RT), 100, 200, and 300 °C. Our analysis encompassed structural, magnetic, electri...

Descripción completa

Detalles Bibliográficos
Autores principales: Fern, Chi-Lon, Liu, Wen-Jen, Chang, Yung-Huang, Chiang, Chia-Chin, Chen, Yuan-Tsung, Lu, Pei-Xin, Su, Xuan-Ming, Lin, Shih-Hung, Lin, Ko-Wei
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2023
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10649230/
https://www.ncbi.nlm.nih.gov/pubmed/37959587
http://dx.doi.org/10.3390/ma16216989
_version_ 1785135518486364160
author Fern, Chi-Lon
Liu, Wen-Jen
Chang, Yung-Huang
Chiang, Chia-Chin
Chen, Yuan-Tsung
Lu, Pei-Xin
Su, Xuan-Ming
Lin, Shih-Hung
Lin, Ko-Wei
author_facet Fern, Chi-Lon
Liu, Wen-Jen
Chang, Yung-Huang
Chiang, Chia-Chin
Chen, Yuan-Tsung
Lu, Pei-Xin
Su, Xuan-Ming
Lin, Shih-Hung
Lin, Ko-Wei
author_sort Fern, Chi-Lon
collection PubMed
description Co(60)Fe(20)Sm(20) thin films were deposited onto glass substrates in a high vacuum setting. The films varied in thickness from 10 to 50 nm and underwent annealing processes at different temperatures: room temperature (RT), 100, 200, and 300 °C. Our analysis encompassed structural, magnetic, electrical, nanomechanical, adhesive, and optical properties in relation to film thickness and annealing temperature. X-ray diffraction (XRD) analysis did not reveal characteristic peaks in Co(60)Fe(20)Sm(20) thin films due to insufficient growth-driving forces. Electrical measurements indicated reduced resistivity and sheet resistance with increasing film thickness and higher annealing temperatures, owing to hindered current-carrier transport resulting from the amorphous structure. Atomic force microscope (AFM) analysis showed a decrease in surface roughness with increased thickness and annealing temperature. The low-frequency alternating current magnetic susceptibility (χ(ac)) values increased with film thickness and annealing temperature. Nanoindentation analysis demonstrated reduced film hardness and Young’s modulus with thicker films. Contact angle measurements suggested a hydrophilic film. Surface energy increased with greater film thickness, particularly in annealed films, indicating a decrease in contact angle contributing to this increase. Transmittance measurements have revealed intensified absorption and reduced transmittance with thicker films. In summary, the surface roughness of CoFeSm films at different annealing temperatures significantly influenced their magnetic, electrical, adhesive, and optical properties. A smoother surface reduced the pinning effect on the domain walls, enhancing the χ(ac) value. Additionally, diminished surface roughness led to a lower contact angle and higher surface energy. Additionally, smoother surfaces exhibited higher carrier conductivity, resulting in reduced electrical resistance. The optical transparency decreased due to the smoother surface of Co(60)Fe(20)Sm(20) films.
format Online
Article
Text
id pubmed-10649230
institution National Center for Biotechnology Information
language English
publishDate 2023
publisher MDPI
record_format MEDLINE/PubMed
spelling pubmed-106492302023-10-31 Surface Roughness-Induced Changes in Important Physical Features of CoFeSm Thin Films on Glass Substrates during Annealing Fern, Chi-Lon Liu, Wen-Jen Chang, Yung-Huang Chiang, Chia-Chin Chen, Yuan-Tsung Lu, Pei-Xin Su, Xuan-Ming Lin, Shih-Hung Lin, Ko-Wei Materials (Basel) Article Co(60)Fe(20)Sm(20) thin films were deposited onto glass substrates in a high vacuum setting. The films varied in thickness from 10 to 50 nm and underwent annealing processes at different temperatures: room temperature (RT), 100, 200, and 300 °C. Our analysis encompassed structural, magnetic, electrical, nanomechanical, adhesive, and optical properties in relation to film thickness and annealing temperature. X-ray diffraction (XRD) analysis did not reveal characteristic peaks in Co(60)Fe(20)Sm(20) thin films due to insufficient growth-driving forces. Electrical measurements indicated reduced resistivity and sheet resistance with increasing film thickness and higher annealing temperatures, owing to hindered current-carrier transport resulting from the amorphous structure. Atomic force microscope (AFM) analysis showed a decrease in surface roughness with increased thickness and annealing temperature. The low-frequency alternating current magnetic susceptibility (χ(ac)) values increased with film thickness and annealing temperature. Nanoindentation analysis demonstrated reduced film hardness and Young’s modulus with thicker films. Contact angle measurements suggested a hydrophilic film. Surface energy increased with greater film thickness, particularly in annealed films, indicating a decrease in contact angle contributing to this increase. Transmittance measurements have revealed intensified absorption and reduced transmittance with thicker films. In summary, the surface roughness of CoFeSm films at different annealing temperatures significantly influenced their magnetic, electrical, adhesive, and optical properties. A smoother surface reduced the pinning effect on the domain walls, enhancing the χ(ac) value. Additionally, diminished surface roughness led to a lower contact angle and higher surface energy. Additionally, smoother surfaces exhibited higher carrier conductivity, resulting in reduced electrical resistance. The optical transparency decreased due to the smoother surface of Co(60)Fe(20)Sm(20) films. MDPI 2023-10-31 /pmc/articles/PMC10649230/ /pubmed/37959587 http://dx.doi.org/10.3390/ma16216989 Text en © 2023 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Fern, Chi-Lon
Liu, Wen-Jen
Chang, Yung-Huang
Chiang, Chia-Chin
Chen, Yuan-Tsung
Lu, Pei-Xin
Su, Xuan-Ming
Lin, Shih-Hung
Lin, Ko-Wei
Surface Roughness-Induced Changes in Important Physical Features of CoFeSm Thin Films on Glass Substrates during Annealing
title Surface Roughness-Induced Changes in Important Physical Features of CoFeSm Thin Films on Glass Substrates during Annealing
title_full Surface Roughness-Induced Changes in Important Physical Features of CoFeSm Thin Films on Glass Substrates during Annealing
title_fullStr Surface Roughness-Induced Changes in Important Physical Features of CoFeSm Thin Films on Glass Substrates during Annealing
title_full_unstemmed Surface Roughness-Induced Changes in Important Physical Features of CoFeSm Thin Films on Glass Substrates during Annealing
title_short Surface Roughness-Induced Changes in Important Physical Features of CoFeSm Thin Films on Glass Substrates during Annealing
title_sort surface roughness-induced changes in important physical features of cofesm thin films on glass substrates during annealing
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10649230/
https://www.ncbi.nlm.nih.gov/pubmed/37959587
http://dx.doi.org/10.3390/ma16216989
work_keys_str_mv AT fernchilon surfaceroughnessinducedchangesinimportantphysicalfeaturesofcofesmthinfilmsonglasssubstratesduringannealing
AT liuwenjen surfaceroughnessinducedchangesinimportantphysicalfeaturesofcofesmthinfilmsonglasssubstratesduringannealing
AT changyunghuang surfaceroughnessinducedchangesinimportantphysicalfeaturesofcofesmthinfilmsonglasssubstratesduringannealing
AT chiangchiachin surfaceroughnessinducedchangesinimportantphysicalfeaturesofcofesmthinfilmsonglasssubstratesduringannealing
AT chenyuantsung surfaceroughnessinducedchangesinimportantphysicalfeaturesofcofesmthinfilmsonglasssubstratesduringannealing
AT lupeixin surfaceroughnessinducedchangesinimportantphysicalfeaturesofcofesmthinfilmsonglasssubstratesduringannealing
AT suxuanming surfaceroughnessinducedchangesinimportantphysicalfeaturesofcofesmthinfilmsonglasssubstratesduringannealing
AT linshihhung surfaceroughnessinducedchangesinimportantphysicalfeaturesofcofesmthinfilmsonglasssubstratesduringannealing
AT linkowei surfaceroughnessinducedchangesinimportantphysicalfeaturesofcofesmthinfilmsonglasssubstratesduringannealing