Properties of tin oxide films grown by atomic layer deposition from tin tetraiodide and ozone

Polycrystalline SnO(2) thin films were grown by atomic layer deposition (ALD) on SiO(2)/Si(100) substrates from SnI(4) and O(3). Suitable evaporation temperatures for the SnI(4) precursor as well as the relationship between growth per cycle and substrate temperature were determined. Crystal growth i...

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Autores principales: Kalam, Kristjan, Ritslaid, Peeter, Käämbre, Tanel, Tamm, Aile, Kukli, Kaupo
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Beilstein-Institut 2023
Materias:
Full Research Paper
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10667712/
https://www.ncbi.nlm.nih.gov/pubmed/38025197
http://dx.doi.org/10.3762/bjnano.14.89
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author Kalam, Kristjan
Ritslaid, Peeter
Käämbre, Tanel
Tamm, Aile
Kukli, Kaupo
author_facet Kalam, Kristjan
Ritslaid, Peeter
Käämbre, Tanel
Tamm, Aile
Kukli, Kaupo
author_sort Kalam, Kristjan
collection PubMed
description Polycrystalline SnO(2) thin films were grown by atomic layer deposition (ALD) on SiO(2)/Si(100) substrates from SnI(4) and O(3). Suitable evaporation temperatures for the SnI(4) precursor as well as the relationship between growth per cycle and substrate temperature were determined. Crystal growth in the films in the temperature range of 225–600 °C was identified. Spectroscopic analyses revealed low amounts of residual iodine and implied the formation of single-phase oxide in the films grown at temperatures above 300 °C. Appropriateness of the mentioned precursor system to the preparation of SnO(2) films was established.
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spelling pubmed-106677122023-11-13 Properties of tin oxide films grown by atomic layer deposition from tin tetraiodide and ozone Kalam, Kristjan Ritslaid, Peeter Käämbre, Tanel Tamm, Aile Kukli, Kaupo Beilstein J Nanotechnol Full Research Paper Polycrystalline SnO(2) thin films were grown by atomic layer deposition (ALD) on SiO(2)/Si(100) substrates from SnI(4) and O(3). Suitable evaporation temperatures for the SnI(4) precursor as well as the relationship between growth per cycle and substrate temperature were determined. Crystal growth in the films in the temperature range of 225–600 °C was identified. Spectroscopic analyses revealed low amounts of residual iodine and implied the formation of single-phase oxide in the films grown at temperatures above 300 °C. Appropriateness of the mentioned precursor system to the preparation of SnO(2) films was established. Beilstein-Institut 2023-11-13 /pmc/articles/PMC10667712/ /pubmed/38025197 http://dx.doi.org/10.3762/bjnano.14.89 Text en Copyright © 2023, Kalam et al. https://creativecommons.org/licenses/by/4.0/This is an open access article licensed under the terms of the Beilstein-Institut Open Access License Agreement (https://www.beilstein-journals.org/bjnano/terms/terms), which is identical to the Creative Commons Attribution 4.0 International License (https://creativecommons.org/licenses/by/4.0 (https://creativecommons.org/licenses/by/4.0/) ). The reuse of material under this license requires that the author(s), source and license are credited. Third-party material in this article could be subject to other licenses (typically indicated in the credit line), and in this case, users are required to obtain permission from the license holder to reuse the material.
spellingShingle Full Research Paper
Kalam, Kristjan
Ritslaid, Peeter
Käämbre, Tanel
Tamm, Aile
Kukli, Kaupo
Properties of tin oxide films grown by atomic layer deposition from tin tetraiodide and ozone
title Properties of tin oxide films grown by atomic layer deposition from tin tetraiodide and ozone
title_full Properties of tin oxide films grown by atomic layer deposition from tin tetraiodide and ozone
title_fullStr Properties of tin oxide films grown by atomic layer deposition from tin tetraiodide and ozone
title_full_unstemmed Properties of tin oxide films grown by atomic layer deposition from tin tetraiodide and ozone
title_short Properties of tin oxide films grown by atomic layer deposition from tin tetraiodide and ozone
title_sort properties of tin oxide films grown by atomic layer deposition from tin tetraiodide and ozone
topic Full Research Paper
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10667712/
https://www.ncbi.nlm.nih.gov/pubmed/38025197
http://dx.doi.org/10.3762/bjnano.14.89
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